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Title:
PHOTOSENSITIVE DIAZONIUM SALT AND PHOTOSENSITIVE DIAZO COMPOSITION AND DIAZO RESIN
Document Type and Number:
Japanese Patent JPH03274044
Kind Code:
A
Abstract:

PURPOSE: To provide the photosensitive diazo composition superior in stability by using the photosensitive diazonium salt of an aromatic diazo compound and a specified α, ω-dicarboxylic acid.

CONSTITUTION: The photosensitive diazonium salt of the aromatic diazo compound and the α, ω-dicarboxylic acid represented by the general formula I: HO2C(CH2)nCO2H, n being an integer of ≥ 2, is good in solubility in water and organic solvents and high in stability and low in inflamability, thus permitting this diazonium salt to be useful as an active component of the photosensitive diazo type copying material, and this diazo composition to be generally used for coating a substrate and superior in stability.


Inventors:
FUKAZAWA DENSHICHIRO
WATANABE KENICHI
YAMASHITA IZUMI
MORIMOTO MASAKI
Application Number:
JP7477490A
Publication Date:
December 05, 1991
Filing Date:
March 23, 1990
Export Citation:
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Assignee:
RESUPE KEMIKARU KK
International Classes:
G03F7/016; C07C245/20; G03C1/52; G03C1/54; G03C1/61; G03F7/021; (IPC1-7): G03C1/52; G03C1/54; G03C1/61; G03F7/016; G03F7/021
Attorney, Agent or Firm:
Kabazawa Xiang (3 people outside)