PHOTOSENSITIVE FILM COPOLYMER, ITS MANUFACTURE, PHOTOSENSITIVE FILM, MANUFACTURE OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

Japanese Patent JP3506594

B2

PROBLEM TO BE SOLVED: To provide the photosensitive film copolymer and its manufacture superior in etching resistance, heat resistance, and adhesiveness and capable of preventing rounding of the upper parts of a pattern and forming a sharp pattern high in resolution by copolymerizing plural kinds of aliphatic cyclic olefins with an amine.
SOLUTION: This photosensitive film copolymer is made from at least 2 kinds of aliphatic cyclic olefins, preferably, embodied by vibylkenecarbonate and 2-cyclopentene-1-acetate and the like, and at least one kind of amine, preferably, embodied by N-methylallylamine and N-allyamine and the like. This copolymer has a molecular weight of, preferably, 3,000-20,000 and it can be manufactured by radically polymerizing at least 2 kinds of aliphatic cyclic olefins with at least one kind of amine in the presence of a usual radical polymerization initiator at high temperature and in high pressure.

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Chung Jaechang
Chihung Roh
Park Pil temperature

JP253598A

March 15, 2004

January 08, 1998

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HYNIX SEMICONDUCTOR INC.

G03F7/027; C08F2/48; C08F226/02; C08F232/00; G03F7/039; H01L21/027; G03F7/004; (IPC1-7): G03F7/039; C08F226/02; C08F232/00; H01L21/027

JP7292182A
JP7128856A
JP6118656A
JP6116341A
JP5148347A

Hiroshi Arafune (1 person outside)

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