Title:
感光性フィルム
Document Type and Number:
Japanese Patent JP6902826
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive film having such properties that a photosensitive resin composition containing a phenolic resin having a specific structure shows good application property on a support film subjected to a release treatment to obtain a high releasing property, a photosensitive layer shows sufficiently high releasing property from the support film, and a pattern free of defects can be formed.SOLUTION: The photosensitive film comprises layers in the following order of: a support film having a release treatment layer formed on at least one surface thereof; a photosensitive layer formed from a photosensitive resin composition comprising a phenolic resin (A) having a repeating unit represented by general formula (1) and general formula (2), a photoacid generator (B), a solvent (C), and a silicone type surfactant (D); and a protective film. The photosensitive layer is arranged on the release treatment layer of the support film.SELECTED DRAWING: Figure 1
Inventors:
Mitsuru Fujita
Application Number:
JP2016006316A
Publication Date:
July 14, 2021
Filing Date:
January 15, 2016
Export Citation:
Assignee:
ASAHI KASEI KABUSHIKI KAISHA
International Classes:
G03F7/023; C08G61/02; G03F7/004; G03F7/038; G03F7/11; G03F7/20
Domestic Patent References:
| JP2012226148A | ||||
| JP2014123096A | ||||
| JP2015196709A | ||||
| JP2015064484A | ||||
| JP2014091784A | ||||
| JP2013057028A | ||||
| JP2008088197A | ||||
| JP2009222733A | ||||
| JP2013190697A | ||||
| JP2007025012A |
Attorney, Agent or Firm:
Atsushi Aoki
Shinji Mitsuhashi
Kazuhiro Nakamura
Toko Saito
Shunsuke Mima
Shinji Mitsuhashi
Kazuhiro Nakamura
Toko Saito
Shunsuke Mima