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Title:
PHOTOSENSITIVE MATERIAL DEVELOPMENT DEVICE
Document Type and Number:
Japanese Patent JP3903113
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a photosensitive material development device whose throughput is drastically enhanced.
SOLUTION: Photosensitive materials 10a are separated by a dividing part 9 so that an interval L1 between rows thereof and an interval L2 between the photosensitive materials 10a and side walls 51a of an aperture 51 are respectively at least 5 mm or more and disposed in two rows being controlled by the intervals L1 and L2 in accordance with a thickness L3 of the photosensitive materials 10a. After that, the photosensitive materials 10a are transported by roller in a transportation rack 28 through a developing vessel 21 and a bleaching and fixing vessel 22, passed through a blade 53 of a squeezing part 40 in the liquid and transported in the liquid in a washing tank 27.


Inventors:
Enhashi Atsushi
Ochanai
Application Number:
JP2001375549A
Publication Date:
April 11, 2007
Filing Date:
December 10, 2001
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03D3/00; G03F7/30; G03D3/08; G03D3/10; (IPC1-7): G03D3/00; G03D3/08; G03D3/10; G03F7/30
Domestic Patent References:
JP2000258882A
JP6332144A
Attorney, Agent or Firm:
Kazunori Kobayashi
Shigeru Iijima
Kobayashi Hideyoshi