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Patent Searching and Data


Title:
PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHY
Document Type and Number:
Japanese Patent JPS5824149
Kind Code:
A
Abstract:

PURPOSE: To improve the printing resistance by interposing a layer contg. colloidal silica or alumina between the Al foil formed on the base paper and the photosensitive layer.

CONSTITUTION: By applying colloidal silica and colloidal alumina dispersed in a resin soln. or the like to a support obtd. by laminating Al foil on base paper, an intermediate layer is formed. The layer is then coated with a photosensitive layer having a prescribed composition and dried. A photosensitive material for lithography obtd. by this method has a satisfactory adhesive strength, and the photosensitivity, image quality, printing resistance, etc. are stabilized. Since the intermediate layer which is hardly changed with the passage of time can be formed only by evaporating the solvent, superior stability in quality is provided.


Inventors:
NAKAYAMA TAKAO
NAKAO SHIYOU
OOISHI CHIKASHI
SHIBA KEISUKE
Application Number:
JP12332581A
Publication Date:
February 14, 1983
Filing Date:
August 06, 1981
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03G13/28; G03G5/14; (IPC1-7): G03G5/14; G03G13/26