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Title:
PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS, AND METHOD FOR CLEANING SQUEEZING MEANS
Document Type and Number:
Japanese Patent JP2006039297
Kind Code:
A
Abstract:

To provide a method for cleaning a squeezing means by which a squeezing means with dirt adhered can be cleaned by spraying a cleaning liquid at efficient timing, and to provide a photosensitive material processing apparatus which performs the method.

The system waits until a recording sheet S passes in a step S10. After the recording sheet S passed, the system determines whether a cleaning flag is ON or not, that is, the interval of recording sheets S is equal to or longer than a specified time interval T or not in a step S12. When the cleaning flag is ON, the system determines whether a sheet number flag is ON or not in a step S14. If the flag is ON, instruction of cleaning is outputted to a pump P in a step S16, and thereby, the pump P is operated to spray cleaning water through each spraying port during a specified spraying period TF.


Inventors:
MARUHASHI ATSUSHI
NOMURA YOSHIKI
HAYASHI KEIICHI
Application Number:
JP2004220311A
Publication Date:
February 09, 2006
Filing Date:
July 28, 2004
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03D3/00
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda