Title:
PHOTOSENSITIVE MATERIAL PROCESSOR
Document Type and Number:
Japanese Patent JP3857374
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To prevent the deterioration of processing solution even through a processing quantity is small and to realize replenishment by a small quantity by reducing a mother liquor quanity and performing the renewing of the processing solution in a short time even by low processing capacity.
SOLUTION: Both sides of a processing rack 52 where the photosensitive material is fed while incorporating the processing solution are partially brought into close contact with a processing tank 54, and a circulating path 56 where the processing solution is made to circulate is formed between the processing rack 52 and the processing tank 54. Circulation filters 58 filtering the processing solution are respectively attached at both sides of the processing rack 52. A pair of the circulating paths 56 is respectively connected to a heater 60 positioned at the lower part of the processing rack 52. A pipe 62 extended from the center part of the heater 60 is connected to the center part of the processing rack 52 by passing through the center parts of a circulation pump 54 and the processing tank 54.
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Inventors:
Fumio Mogi
Application Number:
JP4623497A
Publication Date:
December 13, 2006
Filing Date:
February 28, 1997
Export Citation:
Assignee:
FUJIFILM Holdings Co., Ltd.
International Classes:
G03D3/02; (IPC1-7): G03D3/02
Domestic Patent References:
JP7109503B2 | ||||
JP8160588A | ||||
JP56159645A | ||||
JP62183460A | ||||
JP62089052A | ||||
JP2007040A | ||||
JP4083251A | ||||
JP62246056A |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
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