Title:
PHOTOSENSITIVE PASTE COMPOSITION AND METHOD FOR FORMING ELECTRODE PATTERN
Document Type and Number:
Japanese Patent JP2011158561
Kind Code:
A
Abstract:
To provide a low-cost photosensitive paste composition, with which a high-definition pattern in a thin film having a low resistance and less roughness at a pattern edge can be formed on a glass substrate, and to provide a method for forming a pattern that uses the photosensitive paste composition.
The photosensitive paste composition contains (A) a conductive powder having a colorant on the surface, (B) an alkali-soluble resin, (C) a multifunctional (meth)acrylate and (D) a photopolymerization initiator.
Inventors:
HIRANO TOSHISANE
MOCHIZUKI DAIGO
MOCHIZUKI DAIGO
Application Number:
JP2010018259A
Publication Date:
August 18, 2011
Filing Date:
January 29, 2010
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/004; G03F7/40; H01J9/02; H01J11/02; H01J11/22; H01J11/34
Domestic Patent References:
JP2006086123A | 2006-03-30 | |||
JP2000048645A | 2000-02-18 |
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