Title:
PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3758973
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same.
SOLUTION: The photosensitive polymer is represented by formula I (wherein R1 is an acid-decomposable tertiary alkyl ester group; R2 is hydrogen atom, methyl, ethyl, carboxyl, γ-butyrolacton-2-yl-ester, γ-butyrolacton-3-yl-ester, pantolacton-2-yl-ester, mevalonic lactone ester, 3-tetrahydrofurabyl-ester, 2,3- propylene carbonat-1-yl-ester, 3-methy-γ-butyrolacton-3-yl-ester or a 3-20C alicyclic hydrocarbon compound; a/(a+b+c)=0.1-0.7; b/(a+b+c)=0.1-0.8; c/(a+b+c)=0.0-0.8; and (n) is an integer of 0-2).
Inventors:
Kim wise friend
Ki-yong
Lee Hajime
Chung Higashi
Lee Shu
Youn
Cui Ai Shun
Common sense
Ki-yong
Lee Hajime
Chung Higashi
Lee Shu
Youn
Cui Ai Shun
Common sense
Application Number:
JP2000374768A
Publication Date:
March 22, 2006
Filing Date:
December 08, 2000
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08F232/04; C08F32/04; G03F7/004; C08K5/00; C08K5/02; C08K5/17; C08K5/36; C08K5/42; C08L45/00; G03F7/039; H01L21/027; (IPC1-7): C08F32/04; C08K5/00; C08K5/02; C08K5/17; C08K5/36; C08K5/42; C08L45/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2000080124A |
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani