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Title:
PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3758973
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same.
SOLUTION: The photosensitive polymer is represented by formula I (wherein R1 is an acid-decomposable tertiary alkyl ester group; R2 is hydrogen atom, methyl, ethyl, carboxyl, γ-butyrolacton-2-yl-ester, γ-butyrolacton-3-yl-ester, pantolacton-2-yl-ester, mevalonic lactone ester, 3-tetrahydrofurabyl-ester, 2,3- propylene carbonat-1-yl-ester, 3-methy-γ-butyrolacton-3-yl-ester or a 3-20C alicyclic hydrocarbon compound; a/(a+b+c)=0.1-0.7; b/(a+b+c)=0.1-0.8; c/(a+b+c)=0.0-0.8; and (n) is an integer of 0-2).


Inventors:
Kim, Hyun-woo
Kwon, Ki-young
Shikei RI.
Dong-won, Jung
Shuku RI.
Yoon, Kwang-sub
Sang-jun, Choi
Woo, Sang-gyun
Application Number:
JP2000000374768
Publication Date:
March 22, 2006
Filing Date:
December 08, 2000
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C08F232/04; G03F7/004; C08F32/04; C08K5/00; C08K5/02; C08K5/17; C08K5/36; C08K5/42; C08L45/00; G03F7/039; H01L21/027; (IPC1-7): C08F32/04; C08K5/00; C08K5/02; C08K5/17; C08K5/36; C08K5/42; C08L45/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2000080124A
Attorney, Agent or Firm:
八田 幹雄
野上 敦
奈良 泰男
齋藤 悦子
宇谷 勝幸