Title:
PHOTOSENSITIVE POLYMER CONTAINING COPOLYMER OF ADAMANTYLALKYL VINYL ETHER AND RESIST COMPOSITION CONTAINING IT
Document Type and Number:
Japanese Patent JP2004043807
Kind Code:
A
Abstract:
To provide a photosensitive polymer which satisfactorily ensures dry etching resistance while keeping the production cost low and has superior adhesiveness to an under film.
The photosensitive polymer is characterized by containing a copolymer represented by chemical formula 1 (in the formula, x is an integer of 1-4, R1 is hydrogen or methyl group, R2 is a 4-20C hydrocarbon group, and wherein p/(p+q+r)=0.1-0.4, q/(p+q+r)=0.2-0.5, and r/(p+q+r)=0.1-0.4 ).
Inventors:
SANG-JUN CHOI
Application Number:
JP2003176840A
Publication Date:
February 12, 2004
Filing Date:
June 20, 2003
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G03F7/004; C08F216/14; C08F216/16; C08F220/10; C08F222/06; C08F232/04; G03F7/00; G03F7/039; H01L21/027; (IPC1-7): C08F220/10; C08F216/16; C08F222/06; C08F232/04; G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii