PHOTOSENSITIVE POLYMER MATERIAL

Title:

PHOTOSENSITIVE POLYMER MATERIAL

Document Type and Number:

Japanese Patent JPS59231531

Kind Code:

A

Abstract:

PURPOSE: To obtain a photosensitive polymer material superior in micropattern forming ability, transparency, heat resistance, water and solvent resistance, etc. by polymerizing a specified benzalacetophenone compound and glycidyl methacrylate.

CONSTITUTION: 5W80mol% benzalacetophenone compd., such as 4-methacryloyl- oxybenzalacetophenone and 95W20mol% glycidyl methacrylate are radically copolymerized in a solvent, such as cyclohexanone, in the presence of polymn. initiator, such as benzoyl peroxide, at normal temp. W100°C for 30minW several days to produce a photosensitive polymer material of a random copolymer having 300W3000 polymn. degree composed of a building block of formula I (A is formula II or III, and R is H, methyl, or methoxy) and a building block of formula IV. This material is dissolved in a solvent, such as xylene, applied to a support, and exposed to light of ≤400nm wavelength.

Inventors:

ICHIHASHI TAICHI
KAWAI WASABUROU
NARAOKA TADASHI
ASANO TAKATERU

Application Number:

JP10640283A

Publication Date:

December 26, 1984

Filing Date:

June 13, 1983

Export Citation:

Click for automatic bibliography generation Help

Assignee:

KOGYO GIJUTSUIN
SANPO KAGAKU KENKYUSHO KK

International Classes:

C08F20/00; C08F20/10; C08F20/32; C08F220/30; C08F220/32; G03F7/038; H01L21/027; (IPC1-7): G03C1/71; C08F220/32; C08F220/40; G03F7/00

Domestic Patent References:

JPS4914352A	1974-02-07
JPS5397416A	1978-08-25

Attorney, Agent or Firm:

Eiji Saegusa (2 others)

Previous Patent: NAGATIVE TYPE PHOTOSENSITIVE SILVER HALIDE MATERIAL

Next Patent: EXPLOSIVE DIAZO OR AZIDE COMPOUND WITH FREE OF SENSITIVITY