Title:
PHOTOSENSITIVE POLYMER AND RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP2003327631
Kind Code:
A
Abstract:
To obtain a photosensitive polymer having uniformly distributed hydrophilic units and hydrophobic units, and a resist composition containing the same.
The photosensitive polymer comprises a structure represented by formula (1) [wherein, R1 and R2 are each independently hydrogen atom or methyl group, R3 is a 4-20C hydrocarbon group that is decomposable with an acid, R4 is a hydrophilic group, (a), (b), (c), (d) and (e) represent each the polymerization degree of each repeating unit, provided that a/(a+b+c+d+e) is 0.01-0.6, b/(a+b+c+d+e) is 0.05-0.7, c/(a+b+c+d+e) is 0.01-0.6, d/(a+b+c+ d+e) is 0.1-0.5, and e/(a+b+c+d+e) is 0.01-0.5].
Inventors:
KIM HYUN-WOO
WOO SANG-GYUN
JUNG MYOUNG-HO
WOO SANG-GYUN
JUNG MYOUNG-HO
Application Number:
JP2003111886A
Publication Date:
November 19, 2003
Filing Date:
April 16, 2003
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G03F7/039; C08F220/12; C08F220/26; C08F222/06; C08F232/04; C08F234/02; G03C1/492; G03C1/494; G03F7/004; G03F7/038; H01L21/027; (IPC1-7): C08F232/04; C08F220/12; C08F222/06; C08F234/02; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Mikio Hatta (4 outside)