Title:
感光性ポリマーおよびこれを含むレジスト組成物
Document Type and Number:
Japanese Patent JP4567158
Kind Code:
B2
Abstract:
A photosensitive polymer having a cyclic backbone and containing an alicyclic compound and a resist composition obtained therefrom are provided. The photosensitive polymer has a weight-average molecular weight of between about 3,000-100,000 and represented by the following formula:wherein R1, R2 and R5 are independently hydrogen or methyl, R3 is methyl, ethyl, C3 to C20 aliphatic hydrocarbon or alicyclic compound, R4 is hydrogen, hydroxy, hydroxymethyl, carboxylic acid, 2-hydroxyethyloxycarbonyl, tert-butoxycarbonyl or alicyclic compound, R6 is hydrogen atom, 2-hydroxyethyl, tert-butyl, isobornyl, adamantyl, norbornyl or menthyl, l/(l+m+n+p) is between about 0.1-0.5, m/(l+m+n+p) is between about 0.3-0.5, n/(l+m+n+p) is between about 0.0-0.3, and p/(l+m+n+p) is between about 0.0-0.3.
Inventors:
Cui Ai Shun
Application Number:
JP2000231005A
Publication Date:
October 20, 2010
Filing Date:
July 31, 2000
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
C08F222/06; C08F220/06; C08F232/00; C08K5/00; C08L45/00; G03F7/039; H01L21/027; G03F7/004
Domestic Patent References:
| JP11002903A | ||||
| JP10153864A | ||||
| JP10316720A | ||||
| JP2000098615A |
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani