Title:
PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTIVE FILM, AND ELEMENT HAVING THE PROTECTIVE FILM
Document Type and Number:
Japanese Patent JP2016194686
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive polysiloxane composition good in adhesive properties upon printing, a protective film, and an element having the protective film.SOLUTION: Provided is a photosensitive polysiloxane composition comprising: polysiloxane (A); o- naphthoquinonediazide sulfonate (B); and a solvent (C). The polysiloxane (A) being a polycondensate of monomer components, and the monomer components include: a titanium-containing compound (a-1) and a silane monomer represented by formula (2). The titanium-containing compound (a-1) is selected from the group consisting of a compound represented by formula (1-1) and a hydrolyzable titanium dimer: Ti(R)(R)formula (1-1) and Si(R)(OR)(2) formula (2).SELECTED DRAWING: None
Inventors:
WU MING-JU
SHI SHUNAN
SHI SHUNAN
Application Number:
JP2016065096A
Publication Date:
November 17, 2016
Filing Date:
March 29, 2016
Export Citation:
Assignee:
CHI MEI CORP
International Classes:
G03F7/075; C08G77/58; C08G79/00; C08K5/42; C08L83/08; C09D7/12; C09D183/02; G03F7/023
Domestic Patent References:
| JPH03288857A | 1991-12-19 | |||
| JPH03260653A | 1991-11-20 | |||
| JP2007163846A | 2007-06-28 | |||
| JP2014199919A | 2014-10-23 | |||
| JP2011128385A | 2011-06-30 | |||
| JP2014178672A | 2014-09-25 | |||
| JP2007122029A | 2007-05-17 | |||
| JP2011123450A | 2011-06-23 |
Foreign References:
| WO2013012068A1 | 2013-01-24 | |||
| WO2014058018A1 | 2014-04-17 | |||
| US20050196699A1 | 2005-09-08 |
Attorney, Agent or Firm:
Kenji Sugimura
Yamaguchi Yusuke
Hirota Taura
Yamaguchi Yusuke
Hirota Taura
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