Title:
PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK RESIST, METHOD FOR PRODUCING THE SAME, LIGHT SHIELDING FILM, COLOR FILTER, TOUCH PANEL, AND DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2022013863
Kind Code:
A
Abstract:
To provide a photosensitive resin composition for black resist, which has a high light shielding property and low reflectivity, can form a high precision pattern, and can suppress occurrence of aggregated foreign matter.SOLUTION: A photosensitive resin composition for black resist comprises: an unsaturated group-containing photosensitive resin (A); a photopolymerizable compound having at least 2 or more unsaturated groups (B); a photoinitiator (C); at least one light shielding component selected from the group consisting of a black pigment, a mixed color pigment, and a light shielding material (D); silica particles (E); and a dispersant (F). The dispersant (F) has an acid value and an amine value, and both of the acid value and the amine value are 10 mgKOH/g to 80 mgKOH/g. A ratio of a total mass (mE) of the silica particles (E) to a total mass (mF) of the dispersant (F), (mF/mE), is 0.02 to 0.60.SELECTED DRAWING: None
Inventors:
UCHIDA KAZUYUKI
NIINA MASASHI
NIINA MASASHI
Application Number:
JP2021107970A
Publication Date:
January 18, 2022
Filing Date:
June 29, 2021
Export Citation:
Assignee:
NIPPON STEEL CHEMICAL & MAT CO LTD
International Classes:
G03F7/004; G02B5/20; G03F7/027; G06F3/041; G09F9/00; G09F9/30
Attorney, Agent or Firm:
Washeda International Patent Office