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Title:
PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD USING THE SAME
Document Type and Number:
Japanese Patent JP2010055052
Kind Code:
A
Abstract:

To provide a photosensitive resin composition having favorable properties of sensitivity, a resolution, adhesiveness, a resist feature and stripping characteristics after being cured, and to provide a photosensitive element, a method for forming a resist pattern and a method for manufacturing a printed wiring board using the composition.

The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound including a compound expressed by a formula (1), and (C) a photopolymerization initiator. In the formula, R1 and R2 represents hydrogen atoms or methyl groups, respectively; at least one of R3 and R4 and at least one in R5 to R12 are alkyl groups, cycloalkyl groups or phenyl groups; and -(AO)- and -(OB)- represent (poly)oxyethylene chains or copolymer chains of ethylene oxides and propylene oxides, in which the total number of oxyethylene groups ranges from 2 to 40 and the total number of oxypropylene groups ranges from 0 to 40.


Inventors:
MURAMATSU YUKIKO
MIYASAKA MASAHIRO
Application Number:
JP2009044717A
Publication Date:
March 11, 2010
Filing Date:
February 26, 2009
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/004; G03F7/027; G03F7/031; G03F7/032; G03F7/40; H05K3/06; H05K3/18
Domestic Patent References:
JP2001125474A2001-05-11
JPS5933311A1984-02-23
JP2004231704A2004-08-19
JP2007279381A2007-10-25
JP2007122028A2007-05-17
JP2003330181A2003-11-19
JP2002294100A2002-10-09
Foreign References:
US6703518B12004-03-09
WO2003046615A12003-06-05
WO2002048220A12002-06-20
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu