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Title:
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
Document Type and Number:
Japanese Patent JP2008286852
Kind Code:
A
Abstract:

To provide a photosensitive resin composition having a sufficient effect on improvement of resolution and resist removing property, a photosensitive element, a resist pattern forming method, and a method for manufacturing printed wiring board.

The photosensitive resin composition comprises: (A-1) a binder polymer having a specific structure; (A-2) polyvinyl acetate (having a weight average molecular weight of 10,000-200,000 in terms of polystyrene); (B) a photopolymerizable compound; and (C) a photosensitive resin composition including a photopolymerization initiator.


Inventors:
HIDAKA TAKAHIRO
MIYASAKA MASAHIRO
Application Number:
JP2007129222A
Publication Date:
November 27, 2008
Filing Date:
May 15, 2007
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08F2/44; G03F7/033; C08F263/04; C08F290/06; G03F7/004; G03F7/027; G03F7/031; H05K3/06; H05K3/18