Title:
感光性樹脂組成物、積層体、及びパターン形成方法
Document Type and Number:
Japanese Patent JP7119997
Kind Code:
B2
Abstract:
A photosensitive resin composition comprising (A) a silicone skeleton-containing polymer, (B) a photoacid generator, and (C) a peroxide is coated to form a photosensitive resin coating which is unsusceptible to plastic deformation while maintaining flexibility. A pattern forming process using the composition is also provided.
Inventors:
Kumiko Hayashi
Michihiro Sugo
Michihiro Sugo
Application Number:
JP2018247071A
Publication Date:
August 17, 2022
Filing Date:
December 28, 2018
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C08G59/20; G03F7/075; G03F7/20
Domestic Patent References:
| JP2007122029A | ||||
| JP2008020898A | ||||
| JP2009042422A |
Attorney, Agent or Firm:
Hideaki International Patent Office
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