PURPOSE: To provide a photosensitive resin compsn. having high sensitivity to active energy beams such as far UV, X-rays or electron beams and capable of giving a positive type resist image excellent in resolution and a resist image forming method using the photosensitive resin compsn.
CONSTITUTION: The objective photosensitive resin compsn. contains a resin soluble in an aq. alkali soln., tris(methanesulfonyloxy)benzene, a compd. having an acid-decomposable group and forming a compd. having increased solubility in the aq. alkali soln. by the presence of an acid and cyclic ketone and/or alkoxycarboxylic ester as a solvent. This photosensitive resin compsn. is applied on a substrate, dried, exposed, heated and developed to form a resist image.
KATO KOJI
HASHIMOTO MICHIAKI
SAKAMIZU TOSHIO
SHIRAISHI HIROSHI
HITACHI LTD