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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION AND SPACER PRODUCED BY USING THE SAME
Document Type and Number:
Japanese Patent JP2014174554
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a spacer produced by using the composition.SOLUTION: The photosensitive resin composition comprises an alkali-soluble resin, a photocurable monomer, a photopolymerization initiator, an amino acetophenone-based or amino benzaldehyde-based hydrogen donor, and a solvent, in which photoreactivity is further improved by activating an alkyl radical generated from the photopolymerization initiator to maximize light efficiency, and thereby extremely improved sensitivity is obtained.

Inventors:
CHO YOKAN
INOUE KATSUJI
JANG WON BUM
Application Number:
JP2014045681A
Publication Date:
September 22, 2014
Filing Date:
March 07, 2014
Export Citation:
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Assignee:
DONGWOO FINE CHEM CO LTD
International Classes:
G03F7/031; C07C223/06; C07C225/22; C07C229/60; C07C251/62; C07C321/30
Domestic Patent References:
JP2001174621A2001-06-29
JP2011253152A2011-12-15
JPS5417991A1979-02-09
JP2002040440A2002-02-06
JP2013238851A2013-11-28
JP2013041152A2013-02-28
JP2003162049A2003-06-06
Attorney, Agent or Firm:
Takeshi Ebe
Akifumi Inoue
Morning ratio One husband