To provide an organic/inorganic photosensitive resin composition; which is superior in adhesion, heat resistance, insulation properties, flatness, chemical resistance or the like, and suitable for image forming materials of a liquid crystal display element; which is superior in the dielectric constant, planarity, sensitivity, film-remaining rate, or UV transmittance, particularly, when forming the organic insulating film of the liquid crystal display element, and suitable for use as an organic insulating film for gate; and at the same time, which is suitable for improving the sensitivity and film-remaining ratio as resist resins for overcoat, resist resins for black matrix, resist resins for column spacer, or resist resins for color filter.
The resin composition includes (A) metal oxides selected from among groups consisting of group 3, 4, 5, 13 metal oxides, within a periodic table or groups, consisting of similar two element metal oxides; and (B) (a) acrylic-based copolymers, (b) photoinitiators, (c) polyfunctional monomers having ethylenically unsaturated bonds, (d) silicon-based compounds containing epoxy or amine groups, and (e) solvents.
KIM BYUNG-UK
YUN JUUPYO
KUU KIHYOKU
YO TEFUN
JON UICHORU
KIM DONMYON
CHE SANGAKU
LEE HOJIN
SHIN HONDE
LEE DONHYOKU
| JP2003316000A | 2003-11-06 | |||
| JPH10171106A | 1998-06-26 | |||
| JP2004503545A | 2004-02-05 | |||
| JP2003316000A | 2003-11-06 | |||
| JPH10171106A | 1998-06-26 | |||
| JP2004503545A | 2004-02-05 | |||
| JP2005189399A | 2005-07-14 |
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