Title:
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, PROTRUSION FOR LIQUID CRYSTAL ORIENTATION CONTROL AND METHOD FOR PRODUCING SAME, AND LIQUID CRYSTAL DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2005215137
Kind Code:
A
Abstract:
To provide a photosensitive resin composition and a photosensitive transfer material suitable for use in the formation of protrusions for liquid crystal alignment control which regulate an alignment of liquid crystal molecules, ensuring a uniform thickness even when such protrusions for liquid crystal alignment control are formed on a large substrate, and having a wide development latitude, and provide protrusions for liquid crystal alignment control formed using those, a method for forming the protrusions, and a liquid crystal display device using the same.
The photosensitive resin composition contains a phenol novolac resin, a naphthoquinonediazido ester and a divalent or higher valence aliphatic carboxylic acid.
Inventors:
KODAMA TOMOHIRO
ITO HIDEAKI
SUGIYAMA SUSUMU
ITO HIDEAKI
SUGIYAMA SUSUMU
Application Number:
JP2004019640A
Publication Date:
August 11, 2005
Filing Date:
January 28, 2004
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/004; G02F1/1337; G03F7/022; G03F7/023; G03F7/11; (IPC1-7): G03F7/004; G02F1/1337; G03F7/022; G03F7/023; G03F7/11
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
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