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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP01174521
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive resin composition, containing respective specific high polymer binder, unsaturated compound, amino resin and sensitizer (system), capable of forming solder masks having excellent resolution, solder heat resistance and boiling resistance, etc., and suitable for producing printed circuit boards, etc.

CONSTITUTION: A photosensitive resin composition obtained by blending (A) 100pts.wt. high polymer binder soluble in aqueous solutions of alkalis and insoluble in water (preferably methyl methacrylate/ethyl acrylate/methacrylic acid copolymer) with (B) preferably 40W380pts.wt. unsaturated compound prepared by reacting triglycidyl isocyanurate with an unsaturated group-containing monocarboxylic acid at 0.9W1.05 ratio of acid quiv./epoxy equiv., (C) preferably 10W60pts.wt. amino resin (preferably hexamethoxymethylmelamine) and (D) preferably 0.1W40pts.wt. sensitizer (system) (e.g., 2-ethylanthraquinone) forming free radicals by active rays.


Inventors:
Tsukada, Katsushige
Hattori, Kenji
Tsuchiya, Katsunori
Fujii, Tadashi
Application Number:
JP1987000335087
Publication Date:
July 11, 1989
Filing Date:
December 28, 1987
Export Citation:
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Assignee:
HITACHI CHEM CO LTD
International Classes:
C08G59/32; C08G59/00; C08G59/26; C08G59/50; C08L63/00; G03F7/032; G03F7/033; H05K1/00; H05K3/28; (IPC1-7): C08G59/32; C08G59/50; G03C1/68