Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2000019724
Kind Code:
A
Abstract:
To provide a photosensitive composition, exhibiting formability of a contrasty picture without lowering sensitivity, and satisfactory, in particular, in contrast, fuzzy printing, white-light safety, and large development tolerance.
This composition contains a high-polymer compound having, at least, (a) a fluoro-aliphatic group and (b) an acidic group having hydrogen atoms bonded to carbon atoms neighboring an electron attractive group, and preferably, has, as copolymeric constituents, (a) an additionally polymerizable monomer having a fluoro-aliphatic group and (b) an additionally polymerizable monomer having an acidic group with hydrogen atoms bonded to carbon atoms neighboring an electron attractive group.
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Inventors:
KAWAMURA KOICHI
Application Number:
JP18478398A
Publication Date:
January 21, 2000
Filing Date:
June 30, 1998
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/004; G03F7/00; (IPC1-7): G03F7/004; G03F7/00
Attorney, Agent or Firm:
Tadashi Hagino (4 outside)
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