Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2010079163
Kind Code:
A
Abstract:

To provide a photosensitive resin composition exhibiting excellent alkali developability and an extremely small warpage by curing shrinkage.

The alkali developable photosensitive composition (Q) contains a hydrophilic resin (A), a polyfunctional (meth)acrylate monomer (B), a carboxyl group-modified cellulose (C) having an aromatic ring in the molecule, and a photo-radical polymerization initiator (D).


Inventors:
AZUMA KEIICHIRO
YAMAMOTO YUSUKE
Application Number:
JP2008249922A
Publication Date:
April 08, 2010
Filing Date:
September 29, 2008
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SANYO CHEMICAL IND LTD
International Classes:
G03F7/004; G03F7/027; G03F7/032; H05K3/28
Domestic Patent References:
JPH11228640A1999-08-24
JP2009237057A2009-10-15
JP2007057587A2007-03-08
JP2007010835A2007-01-18
JP2005250292A2005-09-15
JP2005024893A2005-01-27
JP2004177562A2004-06-24
JP2006065000A2006-03-09
JPH0854734A1996-02-27
JP2006145606A2006-06-08
JPH11228640A1999-08-24
JP2009237057A2009-10-15
JP2007057587A2007-03-08
JP2007010835A2007-01-18
JP2005250292A2005-09-15
JP2005024893A2005-01-27
JP2004177562A2004-06-24