Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2010079163
Kind Code:
A
Abstract:
To provide a photosensitive resin composition exhibiting excellent alkali developability and an extremely small warpage by curing shrinkage.
The alkali developable photosensitive composition (Q) contains a hydrophilic resin (A), a polyfunctional (meth)acrylate monomer (B), a carboxyl group-modified cellulose (C) having an aromatic ring in the molecule, and a photo-radical polymerization initiator (D).
Inventors:
AZUMA KEIICHIRO
YAMAMOTO YUSUKE
YAMAMOTO YUSUKE
Application Number:
JP2008249922A
Publication Date:
April 08, 2010
Filing Date:
September 29, 2008
Export Citation:
Assignee:
SANYO CHEMICAL IND LTD
International Classes:
G03F7/004; G03F7/027; G03F7/032; H05K3/28
Domestic Patent References:
JPH11228640A | 1999-08-24 | |||
JP2009237057A | 2009-10-15 | |||
JP2007057587A | 2007-03-08 | |||
JP2007010835A | 2007-01-18 | |||
JP2005250292A | 2005-09-15 | |||
JP2005024893A | 2005-01-27 | |||
JP2004177562A | 2004-06-24 | |||
JP2006065000A | 2006-03-09 | |||
JPH0854734A | 1996-02-27 | |||
JP2006145606A | 2006-06-08 | |||
JPH11228640A | 1999-08-24 | |||
JP2009237057A | 2009-10-15 | |||
JP2007057587A | 2007-03-08 | |||
JP2007010835A | 2007-01-18 | |||
JP2005250292A | 2005-09-15 | |||
JP2005024893A | 2005-01-27 | |||
JP2004177562A | 2004-06-24 |