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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2014052401
Kind Code:
A
Abstract:

To provide a photosensitive resin composition from which a pattern can be formed at a low temperature.

The photosensitive resin composition comprises a binder resin (A), a polymerizable compound (B) expressed by formula (I), and a photopolymerization initiator (C). In the formula, R1 represents a hydrogen atom or a methyl group; and X represents -R2-O-R3-, where R2 represents a single bond or an alkylene group having 1 to 5 carbon atoms and R3 represents an alkylene group having 1 to 3 carbon atoms and having a hydroxyl group. The binder resin (A) contains one of a vinyl toluene skeleton, a tricyclodecane skeleton and dicyclopentadiene skeleton. The photosensitive resin composition further contains a colorant (D). A pattern formed of the above photosensitive resin composition and a display device including the pattern are also disclosed.


Inventors:
MIURA HIROYUKI
Application Number:
JP2012194782A
Publication Date:
March 20, 2014
Filing Date:
September 05, 2012
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/027; C08F2/44; C08F2/48; C08F20/40; C08F265/06; G02B5/20; G03F7/004; G03F7/031; H01L21/027
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto