Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2017009915
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of improving controllability of a pattern profile of a sacrificial film.SOLUTION: The photosensitive resin composition is to be used to form a sacrificial film and comprises an alkali-soluble resin containing a copolymer obtained by a repeating unit derived from a norbornene monomer and a repeating unit derived from maleic acid anhydride, a photosensitive agent, and a crosslinking agent.SELECTED DRAWING: None
Inventors:
KATSURAYAMA SATORU
OTOGURO AKIHIKO
TANAKA YOSHITO
OTOGURO AKIHIKO
TANAKA YOSHITO
Application Number:
JP2015127863A
Publication Date:
January 12, 2017
Filing Date:
June 25, 2015
Export Citation:
Assignee:
SUMITOMO BAKELITE CO
International Classes:
G03F7/023; C08F222/02; C08F222/06; C08F222/10; C08F232/08; G03F7/004
Domestic Patent References:
| JP2013064988A | 2013-04-11 | |||
| JP2005004004A | 2005-01-06 | |||
| JP2007316282A | 2007-12-06 | |||
| JP2014232233A | 2014-12-11 | |||
| JP2015007770A | 2015-01-15 | |||
| JP2011107170A | 2011-06-02 | |||
| JP2010248373A | 2010-11-04 | |||
| JP2014074893A | 2014-04-24 | |||
| JP2013218265A | 2013-10-24 | |||
| JP2012215826A | 2012-11-08 | |||
| JP2003255546A | 2003-09-10 |
Foreign References:
| US20150079507A1 | 2015-03-19 | |||
| US20110104614A1 | 2011-05-05 |
Attorney, Agent or Firm:
Shinji Hayami
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