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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS57212217
Kind Code:
A
Abstract:

PURPOSE: A water-developable photosensitive resin composition having high image reproducibility, obtained by blending a partially saponified polyvinyl acetate with a polyfunctional vinyl monomer having good compatibility with it.

CONSTITUTION: (A) 100pts.wt. partially saponified polyvinyl acetate having a saponification degree of 60W90mol%, preferably 70W85mol% is blended with (B) 10W300pts.wt., preferably 20W150pts.wt. polyfunctional vinyl monomer[one having a molecular weight of ≤2,000, two or more bonds shown by the formula (R is H or CH3 in the same molecule, and the number of hydroxyl groups not exceeding the number of unsaturated bonds), to give the desired composition.

USE: Photosensitive material for letterpress printing, intaglio printing, lighography, photoresist, etc.


Inventors:
FUJIKAWA JIYUNICHI
Application Number:
JP9650581A
Publication Date:
December 27, 1982
Filing Date:
June 24, 1981
Export Citation:
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Assignee:
TORAY INDUSTRIES
International Classes:
C08F2/00; C08F2/48; C08F289/00; C08F290/00; C08F299/00; (IPC1-7): C08F2/48; C08F289/00; C08F299/00