Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS59137943
Kind Code:
A
Abstract:
PURPOSE: To obtain a photosensitive resin compsn. exhibiting remarkable stain- preventing effect when it is used for relief printing by incorporating a specified amt. of specified nonionic type fluorocarbon surfactant.
CONSTITUTION: A photosensitive resin compsn. contains 0.001W5wt% nonionic type fluorocarbon surfactant having 4W14C perfluoroalkyl group, such as (2- perfluorooctylethylpolyoxypropyleneether-carbamyl)-polyoxyethylenecarbamyltoluene or perfluoroisopropoxypropyl-silsesquioxane. When its content is less than 0.001wt%, its effect is made poor, and when it is over 5wt%, ink repellency is made too strong and photographic printing effect is deteriorated.
Inventors:
KURAMOTO TAKEO
Application Number:
JP1124983A
Publication Date:
August 08, 1984
Filing Date:
January 28, 1983
Export Citation:
Assignee:
DABURIYUU AARU GUREESU KK
International Classes:
C08F2/00; C08F2/44; C08F2/48; G03C1/00; G03F7/004; (IPC1-7): C08F2/44; C08F2/48; G03F7/02
Domestic Patent References:
JPS5740249A | 1982-03-05 | |||
JPS5660441A | 1981-05-25 | |||
JPS54135004A | 1979-10-19 |
Attorney, Agent or Firm:
Heiyoshi Odashima