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Title:
PHOTOSENSITIVE RESIN INSULATION MATERIAL
Document Type and Number:
Japanese Patent JPH08291231
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive resin insulation material having excellent adhesivity and suitable e.g. for a multilayer printed circuit board having an electroless plating film formed in high reliability by including specific heat- resistant particles capable of dissolving an oxidizing agent and having a specific heat resistance in a photosensitive resin scarcely dissolving the oxidizing agent.

CONSTITUTION: Heat-resistant particles capable of dissolving an oxidizing agent such as chromic acid (salt) or ozone and consisting of agglomerated particles having an average particle diameter of 2-10μm and obtained by agglomerating fine powder of a heat-resistant resin having an average particle diameter of ≤2μm are included in a photosensitive resin such as epoxy resin capable of scarcely dissolving the oxidizing agent. The amount of the heat-resistant particle is preferably 5-35 pts.wt. based on 100 pts.wt. of the solid component of the photosensitive resin scarcely dissolving the oxidizing agent.


Inventors:
ENOMOTO AKIRA
ASAI MOTOO
Application Number:
JP11078796A
Publication Date:
November 05, 1996
Filing Date:
May 01, 1996
Export Citation:
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Assignee:
IBIDEN CO LTD
International Classes:
C08K7/16; C08L101/00; C23C18/22; H01B3/00; H01B3/30; H05K3/28; H05K3/38; H05K3/46; H05K1/00; H05K3/18; (IPC1-7): C08K7/16; C08L101/00; H01B3/00; H05K3/38; H05K3/46
Attorney, Agent or Firm:
Junzo Ogawa (1 person outside)