Title:
PHOTOSENSITIVE RESIST COMPOSITION CONTAINING SILICON AND METHOD FOR USING THE SAME
Document Type and Number:
Japanese Patent JP2744875
Kind Code:
B2
Abstract:
PURPOSE: To provide the composition that is stable to environment and can be developed with an aqueous base by using siloxane polymers each of which contains phenolic hydroxyl groups and is partially esterified with diazonaphthoquinone groups, as components of the composition.
CONSTITUTION: This composition consists of siloxane polymers each having phenolic hydroxyl groups, namely: poly(p-hydroxybenzylsilsesquioxane-CO-p- methoxybenzylsilsesquioxane-CO-p-(2-diazonaphthoquinonesulfonyloxy) silsesquioxane) represented by the formula I; poly(p-hydroxyphenylsilsesquioxane- CO-p-methoxyphenylsilsesquioxane-CO-p-(2-diazo-1-naphthoquinonesulfonyloxy) silsesquioxane) represented by the formula II; and poly(methyl-p- hydroxybenzylsiloxane-CO-methylp-methoxybenzylsiloxane-CO-methyl-p-(2-diazo-1- naphthoquinonesulfonyloxy)siloxane) represented by the formula III.
Inventors:
Krishna G. That Dave
Halvance S That Dave
Joel Earl Whittaker
Halvance S That Dave
Joel Earl Whittaker
Application Number:
JP8649293A
Publication Date:
April 28, 1998
Filing Date:
April 13, 1993
Export Citation:
Assignee:
International Business Machines Corporation
International Classes:
G03F7/023; C08G77/388; C08G77/392; G03F7/075; H01L21/027; H01L21/30; (IPC1-7): G03F7/075; G03F7/023; H01L21/027
Domestic Patent References:
| JP63143538A | ||||
| JP62212645A | ||||
| JP62159141A | ||||
| JP63231331A | ||||
| JP63261255A | ||||
| JP356964A | ||||
| JP1222254A |
Attorney, Agent or Firm:
Kiyoshi Goda (2 outside)