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Patent Searching and Data


Title:
PHOTOSENSITIVE TRANSFER SHEET AND FORMING METHOD FOR RESIST PATTERN
Document Type and Number:
Japanese Patent JPH0635200
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive transfer sheet having a photosensitive resin layer and a temporary supporting body which is free from deposition of dust or the like on the photosensitive resin layer when the temporary supporting body is peeled from a laminated body consisting of the photosensitive transfer sheet and a supporting body to which the photosensitive resin layer is to be transferred.

CONSTITUTION: This photosensitive transfer sheet consists of a synthetic resin temporary supporting body 2, a barrier-type peeling layer 3 or a peeling layer and barrier layer, and an alkali-developing photosensitive resin layer 4 in this order laminated on the supporting body 2. The temporary supporting body 2 has ≤1013Ω/square surface electric resistance. A resist pattern is formed by using this photosensitive transfer sheet 1 and transferring the photosensitive resin layer 4 on a supporting body.


Inventors:
SATO MORIMASA
SHINOZAKI FUMIAKI
Application Number:
JP21346292A
Publication Date:
February 10, 1994
Filing Date:
July 17, 1992
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
C23F1/00; G03F7/004; G03F7/11; G03F7/26; H01L21/027; H05K3/06; (IPC1-7): G03F7/11; C23F1/00; G03F7/004; G03F7/26; H01L21/027; H05K3/06
Attorney, Agent or Firm:
Yasuo Yanagawa