Title:
PHOTOSTABILIZED POLYPROPYLENE
Document Type and Number:
Japanese Patent JP2009091567
Kind Code:
A
Abstract:
To provide a polypropylene composition that is suitable as a polypropylene resin molded products and as a material for such molded products, because of their suppressed dissipation of volatile organic compounds (VOC), further excellent in impact resistance, heat resistance and anti-photo-deterioration stability and additionally has excellent fabrication and environmental properties.
The polypropylene resin composition comprises a propylene block copolymer (A) and 0.05 to 5 pts.wt. of a hindered amine photostabilizer (B) satisfying the requirements of (a), (b) and (c), per 100 pts.wt. of the copolymer (A) and exhibits a melt flow rate of 5 to 200 g/10 min at 230C.
Inventors:
OBAYASHI YOSHIAKI
WATANABE TAKESHI
MARUYAMA TSUYOSHI
WATANABE TAKESHI
MARUYAMA TSUYOSHI
Application Number:
JP2008239219A
Publication Date:
April 30, 2009
Filing Date:
September 18, 2008
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08L23/14; C08K5/13; C08L35/00
Domestic Patent References:
| JP2006045545A | 2006-02-16 | |||
| JPH11147981A | 1999-06-02 | |||
| JP2006137887A | 2006-06-01 | |||
| JP2000143900A | 2000-05-26 |
Foreign References:
| WO2006112434A1 | 2006-10-26 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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