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Patent Searching and Data


Title:
配管構造および建築物
Document Type and Number:
Japanese Patent JP7249460
Kind Code:
B2
Abstract:
To allow a downpipe to easily penetrate through an eaves gutter when the downpipe and the eaves gutter interfere with each other.SOLUTION: A piping structure comprises: a drainage member to cause a siphon phenomenon; an eaves gutter 52 positioned below the drainage member and having a through hole 52c in a bottom 52a; a penetration member 55 fixed to the eaves gutter 52 and disposed in the through hole 52c to penetrate through the bottom 52a; and a downpipe 53 connected to the drainage member and passing through the penetration member 55 to penetrate the bottom 52a. The downpipe 53 comprises: a first downpipe 71 extending downward from the drainage member; and a second downpipe 72 extending downward from the eaves gutter 52, having a larger diameter than the first downpipe 71, and having a bottom edge of the first downpipe 71 disposed therein. The first downpipe 71 or second downpipe 72 is disposed inside the penetration member 55 and penetrates through the bottom 52a.SELECTED DRAWING: Figure 3

Inventors:
Satoshi Takayanagi
Mototaka
Application Number:
JP2022148178A
Publication Date:
March 30, 2023
Filing Date:
September 16, 2022
Export Citation:
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Assignee:
Sekisui Chemical Co.,Ltd.
International Classes:
E04D13/064; E04D13/068; E04D13/08
Domestic Patent References:
JP2017014825A
JP2009203609A
JP2019132060A
JP2022100873A
JP59033935U
JP57106825U
JP2013002144A
JP5089660U
JP4021631U
JP36004376Y1
Attorney, Agent or Firm:
Kazuzumi Nishizawa
Yuichiro Kawagoe
Makiko Otsuki
Hiroshi Yamaguchi