To provide a planar antenna having a low technical requirement level for production capable of maintaining an antenna radiowave characteristic favorably and exhibiting an excellent environment resistance performance, and a method for producing the same.
A planar antenna 100 comprises a substrate 1 having a dielectric, a prescribed pattern disposed on the substrate 1, a conduction film 2 for covering the surface of the substrate 1 excluding the above prescribed pattern, and a protection film 6. The above prescribed pattern includes a slot pattern 3 for irradiation disposed on one principal surface of the substrate 1. The protection film 6 having a thickness of 1-200 nm is disposed on the slot pattern 3 for irradiation, the conduction film 2 for covering one principal surface of the substrate 1 on which the slot pattern 3 for irradiation is disposed, and the conduction film 2 for covering the side face of the substrate 1. A production method for the planar antenna of the present invention comprises a step for forming the conduction film 2 through the sputtering method and a step for forming the protection film 6 through the sputtering method.
IIDA TAMOTSU
MIYAUCHI YASUSHI
YOSHIHIRO MASASHI
Next Patent: IMAGE PROCESSOR, IMAGE PROCESSING METHOD AND PROGRAM