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Patent Searching and Data


Title:
PLANE PROCESSING DEVICE FOR WAFER
Document Type and Number:
Japanese Patent JPH11309653
Kind Code:
A
Abstract:

To accurately adjust an inclined angle between a spindle for a table holding a wafer and a spindle for a grinding wheel or abrasion cloth without requiring much time.

This device is provided with mechanisms 78 and 80 adjusting the inclined angle of the spindle for a cup type grinding wheel, a key board 128 inputting information indicating the inclined angle, and a CPU 120. When information is inputted from the key board 128, the CPU 120 computes the inclined angle based on information, and drivingly controls the inclined angle adjusting mechanisms 78 and 80 in such a way that the angle will agree with a computed inclined angle.


Inventors:
ISHIKAWA TOSHIHIKO
KATAGIRI YASUSHI
Application Number:
JP11733698A
Publication Date:
November 09, 1999
Filing Date:
April 27, 1998
Export Citation:
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Assignee:
TOKYO SEIMITSU CO LTD
International Classes:
B24B7/00; H01L21/304; (IPC1-7): B24B7/00; H01L21/304
Attorney, Agent or Firm:
Kenzo Matsuura