Title:
PLANT CULTIVATION METHOD IN PLANT FACTORY
Document Type and Number:
Japanese Patent JP2018046774
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide plant cultivation methods in a plant factory, the methods being able to optimize culture efficiency by improving plant cultivation efficiency and reducing costs for plant cultivation.SOLUTION: The light period and the dark period of artificial lighting for plant cultivation are controlled so as to be periodically repeated, and a plant factory configured to be supplied with carbon dioxide for plant growth promotion has an opening portion at a higher position than a plant cultivation plane in some cultivation chamber wall so that the outside air of the cultivation chamber can ventilate. The plant factory is also configured to obtain carbon dioxide by burning hydrocarbon and to show periodical sawtooth waveform of the concentration of carbon dioxide in the cultivation chamber corresponding to the light-dark period of the artificial lighting, by supplying the combustion gas at a constant speed, being characterized in that the length of a light period of the artificial lighting is set shorter than the length of a dark period.SELECTED DRAWING: Figure 2
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Inventors:
MIZUSHIMA YOSHIHIKO
HIRAI TAKASHI
HIRAI TAKASHI
Application Number:
JP2016184504A
Publication Date:
March 29, 2018
Filing Date:
September 21, 2016
Export Citation:
Assignee:
MIZUSHIMA YOSHIHIKO
International Classes:
A01G7/00; A01G7/02; A01G9/18; A01G9/20
Domestic Patent References:
| JPS63283523A | 1988-11-21 | |||
| JPS52161753U | 1977-12-08 | |||
| JP2012179009A | 2012-09-20 | |||
| JP2015223118A | 2015-12-14 | |||
| JPH09266725A | 1997-10-14 |
Foreign References:
| US20150319933A1 | 2015-11-12 |
Attorney, Agent or Firm:
Takao Koshikawa
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