Title:
PLASMA CVD APPARATUS
Document Type and Number:
Japanese Patent JP2022136227
Kind Code:
A
Abstract:
To provide a plasma CVD apparatus capable of solving the problem that since although the plasma CVD apparatus is used for manufacturing a liquid crystal display, an organic EL display and the like, a standing wave is generated between a pair of electrodes, a film thickness is uneven in applications to a large area substrate of, for example, 2 mx2 m, and to a substrate of 1 mx1 m in a VHF plasma CVD.SOLUTION: In a plasma CVD apparatus, supplying first and second electric powers having a retardation linearly phase-shifting to a plurality of first feed points provided in one end part of a non-ground electrode and a plurality of second feed points provided in the other end part to move plasma to be generated in one direction can equalize the distribution of plasma and as the result, uniform the distribution of film thickness.SELECTED DRAWING: Figure 1
Inventors:
MURATA MASAYOSHI
Application Number:
JP2022119409A
Publication Date:
September 15, 2022
Filing Date:
July 27, 2022
Export Citation:
Assignee:
MURATA MASAYOSHI
International Classes:
C23C16/505; H05H1/46