Title:
プラズマCVD装置、基板処理システム、及び製膜・セルフクリーニング方法
Document Type and Number:
Japanese Patent JP4088616
Kind Code:
B2
Inventors:
Keisuke Kawamura
Hiro Mashima
Yoshiaki Takeuchi
Kenji Tagashira
Hiro Mashima
Yoshiaki Takeuchi
Kenji Tagashira
Application Number:
JP2004249939A
Publication Date:
May 21, 2008
Filing Date:
August 30, 2004
Export Citation:
Assignee:
MITSUBISHI HEAVY INDUSTRIES,LTD.
International Classes:
H01L21/205; C23C16/44; C23C16/509; H01L21/3065
Domestic Patent References:
| JP2004124153A | ||||
| JP2000058465A | ||||
| JP2004228354A |
Attorney, Agent or Firm:
Minoru Kudo
Keisaku Nakao
Keisaku Nakao