Title:
プラズマ除害デバイス
Document Type and Number:
Japanese Patent JP4966973
Kind Code:
B2
Abstract:
A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapor.
Inventors:
Radiu Marirena
Application Number:
JP2008537167A
Publication Date:
July 04, 2012
Filing Date:
September 21, 2006
Export Citation:
Assignee:
Edwards Limited
International Classes:
H01L21/3065; B01D53/32; B01J19/12; C23C16/44; H05H1/24
Domestic Patent References:
| JP2004313998A | ||||
| JP9196773A | ||||
| JP2003321760A | ||||
| JP10284299A | ||||
| JP5190501A |
Foreign References:
| WO1996013621A1 | ||||
| US2710878 | ||||
| WO2001008783A1 |
Attorney, Agent or Firm:
Sadao Kumakura
Disciple Maru Ken
Ino Sato
Mitsuru Matsushita
Ichiro Kurasawa
Yuriko Kudo
Disciple Maru Ken
Ino Sato
Mitsuru Matsushita
Ichiro Kurasawa
Yuriko Kudo