Title:
プラズマアークトーチの位置調節装置
Document Type and Number:
Japanese Patent JP5563097
Kind Code:
B2
Abstract:
The present invention relates to an apparatus for adjusting a position of a plasma arc torch. The apparatus includes an elevation apparatus configured to raise and lower the plasma arc torch with respect to molten silicon, a rotary apparatus configured to circumferentially rotate the plasma arc torch with respect to the molten silicon, and an angle adjustment apparatus configured to adjust an angle of the plasma arc torch with respect to the molten silicon. In addition, a plurality of plasma arc torches is provided and radially disposed at predetermined intervals. Therefore, time consumed to melt solid silicon to form the initial molten silicon is reduced, and casting speed is increased. In addition, fusibility of a source material can be improved, the source material can be stably melted, and economic continuous casting and a high quality silicon ingot for a solar cell can be manufactured.
Inventors:
Kwan Mok Suk
Song De Cho
Song De Cho
Application Number:
JP2012541962A
Publication Date:
July 30, 2014
Filing Date:
December 14, 2010
Export Citation:
Assignee:
KCC CORPORATION
International Classes:
C01B33/02; F27D11/08
Domestic Patent References:
| JP9145254A | ||||
| JP2005293945A | ||||
| JP2002110399A | ||||
| JP8061641A |
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro