Title:
PLASMA ASHING DEVICE
Document Type and Number:
Japanese Patent JP3202877
Kind Code:
B2
Abstract:
PURPOSE: To increase a plasma density by adopting an inductive coupling type method for generating plasma.
CONSTITUTION: A resist coat 106, formed on the surface of a body to be treated W placed on the placing base 44 of a treatment vessel 42, is asked by plasma. In these plasma asking devices 36A and 36B, an antenna member 82 connected to a high-frequency power source 84 is provided on a position opposite to the placing base in order to supply the generated energy of the plasma. High-density plasma for asking is generated in a treatment vessel by the inductive action of an electromagnetic wave radiated from the antenna member.
Inventors:
salt water
Application Number:
JP22877094A
Publication Date:
August 27, 2001
Filing Date:
August 30, 1994
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; C23F4/00; H01L21/027; H01L21/302; H01L21/3065; (IPC1-7): H05H1/46; C23F4/00; H01L21/027; H01L21/3065
Domestic Patent References:
| JP6280029A | ||||
| JP7235393A | ||||
| JP7302787A | ||||
| JP47827A | ||||
| JP2235332A | ||||
| JP6196295A | ||||
| JP4290428A | ||||
| JP515312U |
Attorney, Agent or Firm:
Akihiro Asai (1 person outside)