Title:
PLASMA CLEANING DEVICE FOR SUBSTRATE AND METHOD
Document Type and Number:
Japanese Patent JP3334289
Kind Code:
B2
Abstract:
PURPOSE: To provide a means capable of shortening significantly the unit for the whole device of a structure, wherein a pallet mounted with a multiple of sheets of substrates is housed in a casing for plasma generation and a plasma cleaning of the substrates is conducted.
CONSTITUTION: A plasma cleaning device for substrates is constituted of support walls 13 and 14, which are arranged over a casing 3, in which a plasma cleaning is conducted, and retract temporarily a pallet 2 from a vertically moving means 20, take-in and -out means 30 to 36 for taking the pallet 2, which is placed on the means 20, in the casing 3 and these support walls 13 and 14 or out from the casing 3 and the support walls 13 and 14 and a delivery means 50, which is situated over a transfer path 40 and delivers the substrates 1 between the path 40 and the pallet 2 placed on the means 20.
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Inventors:
Isamu Morisako
Tetsuhiro Iwai
Kazuhiro Noda
Tetsuhiro Iwai
Kazuhiro Noda
Application Number:
JP28228593A
Publication Date:
October 15, 2002
Filing Date:
November 11, 1993
Export Citation:
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
H01L21/302; H01L21/304; H01L21/3065; (IPC1-7): H01L21/304; H01L21/3065
Domestic Patent References:
| JP4123430A |
Attorney, Agent or Firm:
Fumio Iwahashi (2 others)
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