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Patent Searching and Data


Title:
PLASMA CLEANING
Document Type and Number:
Japanese Patent JPH02211626
Kind Code:
A
Abstract:

PURPOSE: To eliminate reaction product completely which is deposited on a rear surface, etc., of a device by carrying out cleaning by moving a sample base in a space of a reduced pressure wherein a sample is plasma-processed.

CONSTITUTION: If plasma cleaning is carried out with a lower electrode 7 lifted through a driving means, reaction product on an inner surface of a discharge tube 5 and a surface of a sample holder 9 can be removed; however, that on a rear surface of a sample holder 9 and a lower electrode 7 where plasma is hard to creep can not be removed. If plasma cleaning is carried out again with the lower electrode 7 descended through the driving means, plasma is formed also between the lower electrode 7 and the sample holder 9, thereby removing reaction product on a rear surface of the sample holder 9 and the lower electrode 7 where the product can not be removed with the lower electrode 7 lifted.


Inventors:
ITO YOICHI
Application Number:
JP3106589A
Publication Date:
August 22, 1990
Filing Date:
February 13, 1989
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01L21/302; H01L21/304; H01L21/3065; (IPC1-7): H01L21/302; H01L21/304
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)