Title:
PLASMA CVD DEVICE
Document Type and Number:
Japanese Patent JPH0513344
Kind Code:
A
Abstract:
PURPOSE: To prevent impurity particles generated by sputtering from flying to a substrate and remove the impurity particles.
CONSTITUTION: Shields 10 constituted of the same material as a substrate 9 are arranged in the parallel direction to open magnetic lines 8 in a plasma reacting room 4. Thus, impurities 12 generated from a discharge pipe wall 11 by the sputtering of plasma 7 are prevented from flying to the substrate.
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Inventors:
KAZUMI HIDEYUKI
TETSUKA TSUTOMU
TETSUKA TSUTOMU
Application Number:
JP16533491A
Publication Date:
January 22, 1993
Filing Date:
July 05, 1991
Export Citation:
Assignee:
HITACHI LTD
International Classes:
C23C14/00; C23C14/34; C23C14/35; C23C16/50; C23C16/511; H01L21/205; H01L21/31; H05H1/46; (IPC1-7): C23C14/35; C23C16/50; H01L21/205; H01L21/31; H05H1/46
Attorney, Agent or Firm:
Yukihiko Takada
Next Patent: JPH0513345