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Title:
PLASMA FILM-FORMING APPARATUS
Document Type and Number:
Japanese Patent JP2011144412
Kind Code:
A
Abstract:

To lower a material cost and save the resource by efficiently using a raw material for film formation when forming a film with plasma.

This plasma film-forming apparatus has a straightening tool 14 arranged between a nozzle 16 for plasma and a site 12 to be film-formed thereon of a substrate 10. The straightening tool 14 has a plasma supply passage 20, a raw-material supply passage 22, a confluent passage 24 for film formation, which is formed by confluence of the plasma supply passage 20 and the raw-material supply passage 22, an exhaust passage 26 for exhausting a plasma discharge gas and an unreacted raw material which have passed the site 12 to be film-formed thereon, and a recovery passage 28 for returning an unreacted raw material in the exhaust passage 26 to the plasma supply passage 20 formed therein. The unreacted raw material which has passed through a rising passage 34 of the exhaust passage 26 together with the plasma discharge gas is condensed by being cooled there by a cooling medium that passes through a cooling pipe 38, is converted to a liquid phase, and is introduced into a vertical passage 30 of the confluent passage 24 for film formation from the recovery passage 28. After that, the raw material which has been volatilized and reactivated by the plasma discharge gas is resupplied to the site 12 to be film-formed thereon.


Inventors:
MANTANI SHUNICHI
Application Number:
JP2010005021A
Publication Date:
July 28, 2011
Filing Date:
January 13, 2010
Export Citation:
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Assignee:
HONDA MOTOR CO LTD
International Classes:
C23C16/44; B01J19/08; H01L21/31; H05H1/24
Domestic Patent References:
JPH10139075A1998-05-26
JPH02123891U1990-10-11
JP2007176547A2007-07-12
JPH0549624U1993-06-29
JPH0699979A1994-04-12
Attorney, Agent or Firm:
Takehiro Chiba
Toshiyuki Miyadera
Shuji Ouchi