Title:
PLASMA IRRADIATION APPARATUS
Document Type and Number:
Japanese Patent JP2020047530
Kind Code:
A
Abstract:
To provide a plasma irradiation apparatus for suppressing generation of a spark between a first terminal and a second terminal when attaching and detaching the first terminal and the second terminal.SOLUTION: A plasma irradiation device 1 includes: an irradiation device, having a plasma generation unit provided with a first terminal 46, for discharging at least one of plasma generated by the plasma generation unit on the basis of power applied to the first terminal and active gas generated by the plasma; a second terminal 25 detachable from the first terminal; and a supply unit 60, for applying power between the first terminal and the second terminal in a first contact state P11 in which the first terminal and the second terminal are in contact with each other, for not applying power between the first terminal and the second terminal when the first terminal and the second terminal switch between a first separated state and a first contact state that are separated from each other.SELECTED DRAWING: Figure 5
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Inventors:
NAGAHARA YU
ATAKA MOTOHARU
INOUE TAKESHI
ATAKA MOTOHARU
INOUE TAKESHI
Application Number:
JP2018176583A
Publication Date:
March 26, 2020
Filing Date:
September 20, 2018
Export Citation:
Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
H05H1/26; A61C19/06
Domestic Patent References:
| JP2018516657A | 2018-06-28 | |||
| JPH06343204A | 1994-12-13 | |||
| JP2012520101A | 2012-09-06 | |||
| JP2001273945A | 2001-10-05 | |||
| JPH10286316A | 1998-10-27 |
Attorney, Agent or Firm:
Nishizawa Kazumi
Yuichiro Kawagoe
Makiko Otsuki
Hiroshi Yamaguchi
Yuichiro Kawagoe
Makiko Otsuki
Hiroshi Yamaguchi