Title:
PLASMA MEASURING METHOD AND DEVICE THEREOF
Document Type and Number:
Japanese Patent JP2001057299
Kind Code:
A
Abstract:
To provide a plasma measuring method and a device thereof capable of measuring electron density and electron temperature simply even in process plasma.
This plasma measuring device is provided with a microwave oscillator 1, a directional coupler 3 for measuring microwave input power of microwaves of the microwave oscillator 1 which enter plasma 6, a directional coupler 9 for measuring microwave output power of microwaves emitted from the plasma 6, and a heterodyne wave detector 10 for detecting a phase difference between microwave measuring wave passing the plasma 6 and reference wave which does not pass the plasma 6 to measure electron density and electron temperature.
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Inventors:
KUBOTA MASABUMI
HAYASHI SHIGENORI
YAMANAKA MICHINARI
SHIBATA ATSUSHI
HAYASHI SHIGENORI
YAMANAKA MICHINARI
SHIBATA ATSUSHI
Application Number:
JP23342099A
Publication Date:
February 27, 2001
Filing Date:
August 20, 1999
Export Citation:
Assignee:
MATSUSHITA ELECTRONICS CORP
International Classes:
H01L21/302; C23C14/54; C23C16/511; H01L21/3065; H05H1/00; (IPC1-7): H05H1/00; H01L21/3065
Attorney, Agent or Firm:
Miyai Akio
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