PURPOSE: To enable the plasma measurement to be performed without fail even in the atmosphere of relatively low electron density by specifying the surface area of a probe for the plasma measurement.
CONSTITUTION: An RF electrode 2 is provided on the upper part of a plasma producing part 11 while a specimen base 3 serving both as a grounding electrode 3 is provided on the lower part of a treatment part 12. Next, a mesh electrode 13 is provided between the RF electrode 3 and the grounding electrode 3 while this mesh electrode 13 is impressed with a bias voltage by a variable electrode 14 so as to prevent a specimen 8 from being directly exposed to the plasma. Next, a plasma measuring probe 1 is provided between the mesh electrode 13 and the specimen 8 thereby enabling the plasma parameters in the treatment part 12 to be measured. Finally, the surface area of the probe 1 is specified to exceed 10-5m2 for increasing the probe current thereby facilitating the analysis of the plasma parameters.
HARA MASATERU
KONO ATSUSHI
SEKIYA MITSUNOBU
SAMEJIMA TOSHIYUKI
