Title:
PLASMA NITRIDING APPARATUS
Document Type and Number:
Japanese Patent JP2018104723
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To suppress a scattering of nitride layer thickness of work-pieces using a plasma nitriding apparatus of a simple structure, because there is a difference of nitride layer thickness between work-pieces located in the central part of a furnace and work-pieces located in the upper part and the lower part of the furnace in a conventional plasma nitriding apparatus.SOLUTION: A plasma nitriding apparatus 1 for nitriding work-pieces W having a furnace body 1a serving as an anode and the work-pieces W serving as a cathode includes a jig 2 which is electrically connected to a power source 8 so as to serve as the cathode and on which the work-pieces W are mounted, and an auxiliary heating member 9 with electric conductivity that is arranged between the jig 2 and the ceiling part 1b of the furnace body 1a and electrically connected to the power source 8 so as to serve as the cathode.SELECTED DRAWING: Figure 1
Inventors:
HIDAKA KOCHI
TSUGE TAKAKI
TSUGE TAKAKI
Application Number:
JP2016248699A
Publication Date:
July 05, 2018
Filing Date:
December 22, 2016
Export Citation:
Assignee:
DOWA THERMOTECH KK
International Classes:
C23C8/36; C21D1/06; C23C8/24; F27B5/04; H05H1/46
Domestic Patent References:
JPS56105473A | 1981-08-21 | |||
JPH11310866A | 1999-11-09 | |||
JPH11315364A | 1999-11-16 | |||
JP2008150698A | 2008-07-03 | |||
JPH09125225A | 1997-05-13 |
Attorney, Agent or Firm:
Koji Hagiwara
Tetsuo Kanamoto
Miaki Kametani
Takashi Saito
Tetsuo Kanamoto
Miaki Kametani
Takashi Saito